| Titre : | Elaboration, characterization and simulation of thin film transistors based on Zinc Oxide |
| Auteurs : | Soufyane Naceur, Auteur ; Noureddine Sengouga, Directeur de thèse |
| Type de document : | Thése doctorat |
| Editeur : | Biskra [Algérie] : Faculté des Sciences Exactes et des Sciences de la Nature et de la Vie, Université Mohamed Khider, 2024 |
| Format : | 1 vol. (186 p.) / ill., couv. ill. en coul / 30 cm |
| Langues: | Anglais |
| Mots-clés: | Elaboration, Characterization, Design, TFT, SILVACO ATLAS, Defects. |
| Résumé : |
The thesis explores the field of polycrystalline semiconductor oxides, particularly zinc oxide (ZnO), as a key component in thin-film transistors (TFTs) crucial for electronic applications like active-matrix liquid crystal displays (AMLCDs). Utilizing numerical simulations with SILVACO ATLAS, the study investigates four main areas. First, the temperature effect on pc-ZnO TFTs is examined, revealing a temperature-dependent drain current with activation energy varying linearly from 0.57 eV to 0.071 eV across different gate voltages. Second, the impact of illumination on PC-ZnO TFTs at a low temperature of 280 K is studied, manipulating electric mobility and deep defects. Third, the grain size and boundary effects on nano-crystalline zinc oxide TFTs are explored through experimental and numerical analysis, demonstrating the influence of deposition temperature on grain size and subsequent transfer characteristics. Lastly, TFTs made of ZnO thin films deposited on various substrates are investigated, detailing the deposition process, pressure control, and annealing conditions. The research provides valuable insights into optimizing the performance of ZnO-based TFTs for electronic applications. |
| Sommaire : |
Table of Contents Acknowledgement ........................................... I Abstract ................................................................................... II Résumé ..........................................................III الملخص ................................................................... IV Table of Contents ................................................. V List of Figures ..................................................................................... IX List of Tables ................................................................................. XII General introduction .......................................................... 1 Chapter I: Zinc oxide properties and deposit methods .......................................... 3 I.1 Introduction ....... 3 I.2 The Zinc Oxide ............................................................................ I.2.1 Properties of zinc oxide ...................................................... 3 I.2.1.1 Evolution of ZnO in research ................................... 4 I.2.1.2 The zincite ............................................................................. 5 I.2.2 Specific of properties of ZnO .......................................................... 7 I.2.3 The main advantages of ZnO in TFT ....................................10 I.3 Thin film of Zinc Oxide .....................................................11 I.3.1 Thin-film technology .......................................................................11 I.3.2 Concept thin film .........................................................................12 I.3.3 The importance of thin films in various fields .......................................13 I.3.4 Zinc Oxide is a material suitable for thin film applications ...............14 I.3.5 Deposition techniques ZnO thin film ........................14 I.3.6 Some deposit techniques ..................................................................16 I.3.6.1 DC deposition ............................................................................16 I.3.6.2 Laser ablation .............................................................................17 I.3.6.3 Sputtering ......................................................................................18 I.3.6.4 Sol-gel.................................................................................19 I.3.7 Thin layer characterization methods of ZnO .........................................23 I.3.7.1 Scanning electron microscopy (SEM) ......................................24 I.3.7.2 Atomic force microscopy (AFM) ..........................................26 I.3.7.3 X-ray diffraction (XRD) ...........................................................28 I.3.7.4 definition .................................................................................28 I.3.7.5 Principle of X-ray diffraction measurement .............................28 I.3.7.6 Bragg's Law .......................................................................30 I.3.7.7 Diffractometer ......................................................31 I.3.7.8 Determination of grain size and constraints .....................................33 Determination of grain size.......................................................34 Determination of constraints ..................................................35 I.3.7.9 UV-Visible Spectroscopy ..............................................36 Operation the monochromator UV .......................................37 The transmittance spectra ..................................................38 Determination of the absorption coefficient ....................................39 Determination of the band gap and Urbach energy .........................................40 Chapter II: History and operation at ZnO the thin film transistors .....................43 II.1 Introduction ........................................................................43 II.2 Oxide Semiconductors and Oxide TFTs: History ....................................43 II.3 Zinc oxide thin film transistors ..........................................45 II.3.1 History of ZnO TFT .............................................. II.3.2 Introduction ..........................................................................................46 II.3.3 Structure the ZnO TFT .........................................................................47 II.4 The principal operation electrical characteristic of a TFT ...............................49 II.4.1 Top gate ZnO TFTs ............................................................................52 II.4.2 Bottom gate ZnO TFTs .....................................................................53 II.4.3 Definition of ZnO transistor Size ( |
Disponibilité (1)
| Cote | Support | Localisation | Statut |
|---|---|---|---|
| TPHY/136 | Théses de doctorat | bibliothèque sciences exactes | Consultable |
