| Titre : | The effect of doping on the properties of thin films of Indium oxide (In 2 O 3) deposited by ultrasonic spray for optoelectronic application |
| Auteurs : | Rahil Azizi, Auteur ; Abdallah Attaf, Directeur de thèse ; Hanane Saidi, Directeur de thèse |
| Type de document : | Thése doctorat |
| Editeur : | Biskra [Algérie] : Faculté des Sciences Exactes et des Sciences de la Nature et de la Vie, Université Mohamed Khider, 2020 |
| Format : | 1 vol. (118 p.) / 30 cm |
| Langues: | Anglais |
| Mots-clés: | Thin films,Indium oxide,doping,Ultrasonic spray,Optoelectronic Properties. |
| Résumé : |
Our study talks about the deposition and characterization of the thin films of un-doped and doped indium oxide films obtained by ultrasonic spray technology with a view to obtaining suitable properties for optoelectronic applications, where: Firstly, we have studied the un-doped indium oxide films with different parameters such as: flow rate solution, molar concentration solution and effect of substrates type. Secondly, we have studied the effect of doping by antimony and molybdenum on indium oxide films , then we have characterized it by different techniques such as: X-RD, SEM, EDS analysis, UV spectroscopy, FTIR spectroscopy, luminous spectroscopy and Four-point technique. The main results obtained are: Indium oxide crystallizes with polycrystalline structure by a cubic structure and it is a semiconductor of type n with a band gap Eg .It has a width between 3.25-4.1 eV for all the films which have a high transmittance up to 85% with disparate electrical conductivity |
| Sommaire : |
ACKNOWLEDGEMENTS General introduction Reference The first part: The general concepts on thin films, Ultrasonic spray elaboration and characterization techniques for indium oxide thin films CHAPTER I: GENERAL CONCEPTS ON THIN FILMS, INDIUM OXIDE AND THE DIFFERENT DEPOSITION TECHNIQUES I.1 Introduction………………………………………………………………………..1 I.2 Thin films:…………………………………………………………………………. 1 I.2.1 Definition of a thin film:………………………………………………………… 1 I.2.2 Steps of the formation and growth of thin film…………………………………..2 I.2.3 Classification of growth patterns………………………………………………... 4 1.2.4 Applications of thin layers……………………………………………………… 6 I.3 Transparent Conductive Oxides (TCO)…………………………………………… 7 I.4 Presentation of the TCO studied [Indium Oxide (In2O3)]……………………….. 9 I.4.1 Properties of indium oxide (In2O3):……………………………………………. 9 I.4.1.1 Crystallographic properties………………………………………………….....9 I.4.1.2 Optical properties:……………………………………………………………. 11 I.4.1.3 Electrical properties :………………………………………………………… 11 I.4.2 Applications of indium oxide………………………………………………….. 12 I.5 Some methods of depositing thin films:………………………………………….13 I.5.1 Physical vapor deposition (PVD)……………………………………………… 14 I.5.2 Chemical vapor deposition (CVD) ……………………………………………. 14 I.6 Ultrasonic pyrolysis spray………………………………………………………. 16 I.6.1 The pyrolysis spray…………………………………………………………… 16 I.6.1.1 Deposit solution (source)……………………………………………………..17 I.6.1 .2 Generation of droplets (transport)………………………………………….. 18 I.6.1 .3 Chemical reaction on the substrate (deposit)……………………………….. 18 Reference…………………………………………………………………………….. 19 CHAPTER II: ULTRASONIC SPRAY ELABORATION AND CHARACTERIZATION TECHNIQUES FOR INDIUM OXIDE FILMS II.1 Introduction:…………………………………………………………………… 22 II.2 Elaboration of thin layers of In2O3 by ultrasonic spray: ……………………….. 22 II.2.1 Experimental montage used: ………………………………………………… 22 II.2.2.Experimental procedure: ………………………………………………………25 II.2.2.1 Experimental conditions: ………………………………………………….. 25 II.2.2.2 Choice of the deposit substrate:……………………………………………. 26 II.2.2.3 Cleaning of substrates:………………………………………………………. 27 II.2.2.4 Adhesion Test………………………………………………………………..27 II.2.2.5 Film thickness ……………………………………………………………… 28 II.3 Characterization Techniques:………………………………………………….. 28 II.3.1 Structural characterization methods:………………………………………… 28 II.3.1.1. X-ray diffraction:…………………………………………………………… 28 II.3.1.2 Scanning electron microscopy (SEM):……………………………………… 32 II.3.2 Optical characterization method:…………………………………………….. 35 II.3.2.1 UV-Visible spectroscopy:…………………………………………………… 35 II.3.2.2 Photoluminescence spectroscopy…………………………………………… 39 II.3.3 Infrared Spectroscopy:……………………………………………………….. 40 II.3.3 Electrical characterization:…………………………………………………… 42 Reference……………………………………………………………………………. 44 The second part: The results and discussion CHAPTER III: GROWTH RATE INFLUENCE ON INDIUM OXIDE THIN FILMS III.1 Introduction:…………………………………………………………………… 46 III.2. Growth rate:……………………………………………………………………. 46 III .3 Structural properties:…………………………………………………………... 47 III.4 Surface morphology:…………………………………………………………… 52 III.5. Optical properties……………………………………………………………… 54 III.6. Electriecal properties…………………………………………………………. 58 III.7 . Conclusions:…………………………………………………………………... 59 References…………………………………………………………………………...60 CHAPTER IV: INFLUENCE OF INDIUM ACETATE ON PROPERTIES OF INDIUM OXIDE THIN FILMS IV .1 Introduction:…………………………………………………………………… 63 IV.2. Growth rate:……………………………………………………………………. 63 IV .3 XRD Analysis :………………………………………………………………... 64 IV.4 UV-VIS transmittance Analysis:………………………………………………. 67 IV.5. Reflectance Analysis :…………………………………………………………. 70 IV.6. FTIR Analysis:………………………………………………………………… 72 IV.7 Electrical study:………………………………………………………………… 73 IV.8.Conclusion:……………………………………………………………………...75 References……………………………………………………………………………76 CHAPTER V: INFLUENCE OF THE SUBSTRATES ON PROPERTIES OF INDIUM OXIDE THIN FILMS V.1 Introduction:…………………………………………………………………….. 81 V.2 Growth rate:……………………………………………………………………... 81 V .3 Structural properties:…………………………………………………………… 83 V .4 Optical properties:……………………………………………………………… 88 V .5 Electrical properties:…………………………………………………………… 90 V .6 Conclusion:……………………………………………………………………... 90 Reference…………………………………………………………………...………...92 CHAPTER VI: EFFECT OF DOPING (Sb and Mo) ON PROPERTIES OF INDIUM OXIDE THIN FILMS VI .1 Introduction: 94 VI.2. Antimony doping (Sb) 95 VI .2.1 Structural properties : 95 VI .2.2 Surface morphology 98 VI .2.3 Optical properties: 100 VI .2.4 FTIR Analysis : 103 VI .2.5 Photoluminescence properties: 104 VI .2.6 Electrical properties: 106 VI. 3. Molybdenum doping (Mo) 105 VI .3.1 Structural properties: 105 VI .3.2 Surface morphology: 110 VI .3.3 Transmittance Analysis: 112 VI .3.4 The resistivity 114 VI .4 Conclusion: 115 References…………………………………………………………………………. Erreur ! Signet non défini. General conclusion |
| En ligne : | http://thesis.univ-biskra.dz/4788/1/Rahil%20AZIZI%20DCTR%2020.pdf |
Disponibilité (1)
| Cote | Support | Localisation | Statut |
|---|---|---|---|
| TPHY/96 | Théses de doctorat | bibliothèque sciences exactes | Consultable |
