| Titre : | study of thin layers of indium oxide in2o3 elaborated by chemical means. |
| Auteurs : | Adel Bouhdjer, Auteur ; Abdallah Attaf, Auteur |
| Type de document : | Thése doctorat |
| Editeur : | Biskra [Algérie] : Faculté des Sciences Exactes et des Sciences de la Nature et de la Vie, Université Mohamed Khider, 2016 |
| Format : | 1 vol. (101p.) / couv. ill. en coul / 30 cm |
| Langues: | Anglais |
| Mots-clés: | Indium oxide ; thin films ; Ultrasonic Spray ; optical and electrical properties |
| Résumé : |
In this work indium oxide (In2O3) thin films have been grown by ultrasonic spray technique usin gIndium chloride (InCl3)as precursor solution. The effect of the deposition time, solution flow rate, surface substrate and annealing temperature on the structural, morphological, optical and electrical properties of these filmshave been studied. A number of techniques, as well as X-ray diffraction (XRD), SEM, and UV-visible are used to characterize the physical properties of these films. X-ray diffraction analysis showed that the films are polycrystalline in nature having cubic crystal structure and symmetry space group Ia3. On the other hand, the preferred growth orientation change from the (222) plane to (400) plane with the increase of the film thickness or decrease of the oxygen concentration in the film.SEM images show that the films are rough surface and the shape of grains changes with the change of the preferential growth orientation. The transmittance improvement of In2O3 films was closely related to the good crystalline quality of the filmsand the optical gap is varied between 3.64eV and 3.93eV. The electrical characterization of our films by the four-point methodshow that the (400)-plane textured In2O3/KCL films has the lowestresistivity(0.8 10-3 Ω cm). |
| Sommaire : |
Generale Introduction.................................................1 CHAPTER I:Indium oxide, properties and deposition techniques I.1Indium Oxideproperties............................4 I.1.1Structural properties………………………………………………………………………….4 I.1.2Electrical properties…………………………………………………………………………..5 I.1.2.1 Formation of oxygen vacancies………………………………………………………...5 I.1.3 Optical properties……………………………………………………………………………..6 I.1.4Application of In2O3…………………………………………………………………………..7 II.1 Thin film growth process………………………………………………………………………8 II.2 Thin film deposition processes………………………………………………………………...9 II.2.1 Physical processes…………………………………………………………………………...12 II.2.1.1 Pulsed laser deposition………………………………………………………………...13 II.2.1.2 Molecular beam epitaxy…………………………………………………………….....13 II.2.1.3 Sputtering……………………………………………………………………………...14 II.2.2. Chemical deposition techniques…………………………………………………………...14 II.2.2.1. Sol-Gel process……………………………………………………………………..15 II.2.2.2. Electrodeposition…………………………………………………………………...16 II.2.2.3. Plasma-assisted chemical vapor deposition………………………………………...17 II.2.2.4. Spray pyrolysis……………………………………………………………………..17 II.2.2.4.1. Advantages of spray pyrolysis…………………………………………………....18 II.2.2.4.2. Fundamental aspects of spray pyrolysis………………………………………….18 CHAPTER II:Technical preparation and characterization II.1.In2O3 thin films prepared by ultrasonic spray………………………………………………22 II.1.2. Experimental conditions…………………………………………………………………...22 II.1.3. Used substrates...............................................................24 II.1.4. Cleaning of the substrates………………………………………………………………….24 II.1.5. Preparation of the solutions………………………………………………………………..25 II.1.6.Used Montage ………………………………………………………………………………26II II.2. Characterization methodsof In2O3......................................28 II.2.1 X-ray diffraction…………………………………………………………………………….28 II.2.2. Determination of the grains size…………………………………………………………..28 II.2.3. Determination of the lattice parameters………………………………………………….29 II.2.4. Strain Determination………………………………………………………………………29 II.2.5. Determination of the dislocation density (δ)……………………………………………...29 II.2.6. Scanning electron microscopy (SEM)……………………………………………………..29 II.2.7. Measurement of film thickness by SEM…………………………………………………..31 II.2.8. Energy Dispersive X-ray analysis(EDX)…………………………………………………32 II.2.9. Infrared Spectroscopy……………………………………………………………………...32 II.2.10.Optical characterization………………………………………………………………….33 II.2.11. Optical Gap………………………………………………………………………………..35 II.2.12. Disorder calculating……………………………………………………………………..36 II.2.13. Refractive index…………………………………………………………………………...37 II.2.14. Four-point probe resistivity measurements……………………………………………..37 CHAPTER III:Deposition times influence on indium oxide thin films properties III.1.Introduction.......................................40 III.2. Growth rate………………………………………………………………………………….40 III.3. XRD analysis………………………………………………………………………………...41 III.4. Morphological properties…………………………………………………………………...47 III.5. optical properties……………………………………………………………………………51 III.6. Electrical properties………………………………………………………………………...54 III.7. Conclusion…………………………………………………………………………………...56 CHAPTER IV:Solution flow rate influence on properties of indium oxide thin films IV.1. Growth rate………………………………………………………………………………….58 IV.2. Structural properties………………………………………………………………………..59 IV.3. Morphological properties…………………………………………………………………...63 IV.4. optical properties…………………………………………………………………………….66 IV.5. Electrical properties…………………………………………………………………………71 IV.6. Conclusion……………………………………………………………………………………72III CHAPTER V:Influence of the Surface Substrate and annealing temperature on indium oxide thin films properties V.I.1. Introduction………………………………………………………………………………..74 V.I.2.Surface Substrate affects on indium oxide thin films properties.......................................74 V.I.2.1.Growth rate……………………………………………………………………………….74 V.I.2. 2. Structural properties…………………………………………………………………….75 V.I.2.3. Morphological properties………………………………………………………………...81 V.I.2.4. optical properties………………………………………………………………………….82 V.I.2.5. Electrical properties………………………………………………………………………84 V.I.2.6. Conclusions………………………………………………………………………………..85 V.II. Effects of annealing temperature on indium oxide thin films properties………………...86 V.II.1. Structural properties………………………………………………………………………86 V.II.2. Optical properties………………………………………………………………………….89 V.II.3. Electrical properties……………………………………………………………………….91 V.II.4. Conclusions………………………………………………………………………………...91 General conclusionand perspectives……………………………………………...92 References……………………………………………………………………………………...94 Publications produced through this work…………………………...................101 |
| En ligne : | http://thesis.univ-biskra.dz/2614/1/Th%C3%A8se_lmd_49_2016.pdf |
Disponibilité (1)
| Cote | Support | Localisation | Statut |
|---|---|---|---|
| TPHY/48 | Théses de doctorat | bibliothèque sciences exactes | Consultable |
